Suppose an n-type wafer is created by doping Si crystal having with 1 ppm concentration of As. On the surface, 200 ppm boron is added to create 'P' region in this wafer. Considering ,
(i) Calculate the densities of the charge carriers in the n & p regions.
(ii) Comment which charge carriers would contribute largely for the reverse saturation current when the diode is reverse biased.
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