Suppose an n-type wafer is created by doping Si crystal having 5×1028atoms/m3 with 1 ppm concentration of As. On the surface, 200 ppm boron is added to create 'P' region in this wafer. Considering ni=1.5×1016m-3

(i) Calculate the densities of the charge carriers in the n & p regions.

(ii) Comment which charge carriers would contribute largely for the reverse saturation current when the diode is reverse biased.